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数位转型
绿色转型
大鎪科技股份有限公司
产品描述 :
This machine is an improved model from the Y Rail model, featuring similar functions.
Designed standard with 4-station hanger with two side doors on blasting chamber. To meet your specific production line requirements, additional hangers are available for the entire working environment. Contact us for further details.
Features:
1.The machine employs a PLC controller for continuous cycles of blasting operation.
2.The cycle motions are: the hanging shaft enters the blasting chamber, and then moves to a fixed position at a lower speed. The door closes automatically.
Once the door is closed, the blade starts running automatically, and the machine performs blasting. Once operation is accomplished, steel balls are supplied and the blade stops automatically.
When the blade comes to a complete stop, the door opens automatically. When the door opens to the fixed position, the chain conveyor quickly delivers the nest hanging rod into the blasting chamber, then moves forward at a lower speed to a fixed position.
The door closes automatically and performs the nest cycle of blasting operation.
大永真空設備股份有限公司
产品描述 :
高功率脈衝磁控濺鍍系統(HiPIMS ，High Power Impulse Magnetron Sputtering) 是一種以高功率脈衝電源進行磁控濺鍍的技術，透過產生比傳統直流濺鍍模式要高上數十倍之瞬間脈衝電流，得到比直流濺鍍要高上百倍至萬倍的電子密度的高密度電漿，而此HIPIMS鍍膜系統可有效提高被濺射粒子的離化率，並可在低基材溫度下得到無孔隙、緻密度高、結晶性佳的薄膜。
HiPIMS 技術的關鍵核心為電源供應器，大永真空獨立HiPIMS電源供應器設計結合單一靶座。將直流電源供應器的電能累積至充電電壓可達數百、數千伏特的脈沖模組電容中，再以電晶體控制放電的脈衝時間、脈衝頻率，以產生高密度電漿於獨立靶面，將靶面中毒的機率降至最低，增加靶材離化率與利用率，節省大量鍍膜成本。
大永DYHC系列HiPIMS濺鍍設備優秀的電源與腔體設計使其擁有高電漿密度(1018~19e-/m3)、高離化率(70～100%)的特點，使薄膜有良好的緻密性、附著性、平整性及抗腐蝕的特性。較低的佔空比(<5%)，使製程溫度大幅降低，基板的選擇也更多，如軟性基板PEN、PET等。
詳情請參考：https://zh-tw.dahyoung.com/
