Dah Young Vacuum Equipment Co., Ltd.
Product Description :
High Power Impulse Magnetron Sputtering (HiPIMS) is a high-power pulsed power supply system used on magnetron sputtering coating technics. Compared to the traditional DC sputtering system, HiPIMS could generate tens of times higher pulsing current to obtain a ten thousand times higher-density electron plasma. Effectively enhancing the ionization rate to obtain a non-porous, high density crystallinity film at lower coating temperatures.
DAH YOUNG's DYHC HiPIMS series sputtering coater power supply and chamber cavity are designed to provide high plasma density (1018~19e-/m3) and high ionization rate (70~100%), increasing the substrate coating compactness, adhesion flatness and corrosion resistance. The lower duty cycle (<5%) results in a significant reduction in process temperature offering more substrate options on PEN, PET, etc. fiexible substrates.
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